Cangzhou, Hebei, China
Response Time: < 24h
Response Rate: 100%
| Model No.: JCPY500 | Place of Origin: China |
Product overview
1. Applicable: Universities, research institutes and enterprises conduct scientific research and small batch preparation of thin film new materials.
2. Product features/uses:
► Small footprint, cheap price, stable performance, low maintenance cost;
► It can be used to prepare single-layer and multi-layer metal films, dielectric films, semiconductor films, magnetic films, sensor films, heat-resistant alloy films, hard films, corrosion-resistant films, etc.;
► Coating examples: silver, aluminum, copper, nickel, chromium, nichrome, titanium oxide, ITO, silicon dioxide, etc.;
► Single target sputtering, multi-target sequential sputtering, common sputtering and other functions.
Technical parameters
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Model |
JCPY500 |
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Vacuum chamber structure |
Vertical front door structure, rear air extraction system, double-layer water cooling |
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Vacuum chamber size |
Φ500×H450mm, with Load-Lock function, support single-chip or multi-chip sampling |
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Heating temperature |
Room temperature~500℃ |
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Sputter method |
Splash up |
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Rotating substrate stage |
Φ150mm |
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Film thickness unevenness |
Φ100mm within≤±5.0% |
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Sputtering target/evaporation electrode |
Φ3, Φ4 inch magnetron target 2-4 optional |
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Process gases |
3-way gas flow control |
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Control method |
PLC+touch screen man-machine interface semi-automatic control system |
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Area |
(Host) L1800×W800×H1845mm |
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Total Power |
≥15KW |
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