Cangzhou, Hebei, China
Response Time: < 24h
Response Rate: 100%
| Model No.: JCP500 | Place of Origin: China |
Product overview
1. Applicable: Universities, research institutes and enterprises conduct scientific research and small batch preparation of thin film new materials.
2. Product features/uses:
►Small footprint, cheap price, stable performance, low maintenance cost;
►It can be used to prepare single-layer and multi-layer metal films, dielectric films, semiconductor films, magnetic films, sensor films, heat-resistant alloy films, hard films, corrosion-resistant films, etc.;
►Coating example: silver, aluminum, copper, nickel, chromium, nickel-chromium alloy, titanium oxide, ITO, silicon dioxide, etc.;
►Single target sputtering, multi-target sequential sputtering, common sputtering and other functions.
Technical parameters
|
Model |
JCP500 |
|
Vacuum chamber structure |
Vertical front door structure, rear exhaust system |
|
Vacuum chamber size |
Φ500×H420mm |
|
Heating temperature |
Room temperature~500℃ |
|
Sputter method |
Up and down sputtering optional |
|
Rotating substrate stage |
Φ150mm |
|
Film thickness unevenness |
Φ100mm within≤±5.0% |
|
Sputtering target/evaporation electrode |
Φ3 3-inch magnetron targets, compatible with DC/MF/RF sputtering |
|
Process gases |
2~3 way gas flow control |
|
Control method |
PLC+touch screen man-machine interface semi-automatic control system |
|
Area |
(Host) L1900×W800×H1900mm |
|
Total Power |
≥10KW |
