Cangzhou, Hebei, China
Response Time: < 24h
Response Rate: 100%
| Model No.: TEMD600 | Place of Origin: China |
Product overview
1. Applicable: Universities, research institutes and enterprises conduct scientific research and small batch preparation of thin film new materials.
2. Product features/uses:
►Equipment integrated design, small footprint, high cost performance, stable performance, low maintenance cost;
►It is suitable for the preparation of metal single film, semiconductor film and organic film in the laboratory, and can also be used for the pre-production process test of the production line;
►Applicable to the preparation of optical thin films, conductive thin films, semiconductor thin films, ferroelectric thin films, etc.
Technical parameters
|
Model |
TEMD600 |
|
Vacuum chamber structure |
Vertical cylindrical side door structure, rear exhaust system |
|
Vacuum chamber size |
Φ600×H750mm |
|
Heating temperature |
Room temperature~300℃ |
|
Rotating substrate stage |
Flat typeΦ350mm, or dome type substrate stage optional |
|
Film thickness unevenness |
≤±5.0% |
|
Kaufman ion source |
Optional |
|
Evaporation source |
Electron gun 8KW 6-cavity crucible, domestic and imported optional, equipped with 2-3 sets of resistance evaporation |
|
Control method |
PLC+touch screen man-machine interface semi-automatic control system |
|
Area |
Length ×Width: L2500×W1600mm |
|
Total Power |
≥17KW |
